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Erschienen in: Microsystem Technologies 9-11/2008

01.10.2008 | Technical Paper

De-tethering of high aspect ratio metallic and polymeric MEMS/NEMS parts for the direct pick-and-place assembly of 3D microsystem

verfasst von: Karthik S. Colinjivadi, Yonghao Cui, Matthew Ellis, George Skidmore, Jeong-Bong Lee

Erschienen in: Microsystem Technologies | Ausgabe 9-11/2008

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Abstract

We report our study on several de-tethering methods for various high aspect ratio metallic and polymeric MEMS and NEMS parts including 5:1 aspect ratio 50 μm thick metallic (nickel) MEMS parts, 3:1 aspect ratio 1 μm thick sub-micron (350 nm) feature size metallic NEMS actuators, and 10:1 aspect ratio 100 μm thick polymer/metal bi-layer MEMS actuators. Resistive heating was found to be effective for the de-tethering of high aspect ratio metallic MEMS parts. In order to de-tether metallic NEMS parts and polymer/metal bi-layer devices, we performed the milling of tethers using a focused ion beam. Very low current (20 pA) ion beam was found to be effective means of de-tethering the metallic NEMS parts. Relatively larger current (0.3–20 nA) ion beam was found to be good for the polymer/metal bi-layer parts. We demonstrated 3D assembly and complete packaging of the de-tethered high aspect ratio metallic and metal/polymer bilayer MEMS parts.

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Metadaten
Titel
De-tethering of high aspect ratio metallic and polymeric MEMS/NEMS parts for the direct pick-and-place assembly of 3D microsystem
verfasst von
Karthik S. Colinjivadi
Yonghao Cui
Matthew Ellis
George Skidmore
Jeong-Bong Lee
Publikationsdatum
01.10.2008
Verlag
Springer-Verlag
Erschienen in
Microsystem Technologies / Ausgabe 9-11/2008
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-008-0579-2

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