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Optical and Quantum Electronics
Erschienen in: Optical and Quantum Electronics 7/2017

01.07.2017

Application of Mie theory and fractal models to determine the optical and surface roughness of Ag–Cu thin films

verfasst von: Ștefan Țălu, Ram Pratap Yadav, Ashok Kumar Mittal, Amine Achour, Carlos Luna, Mohsen Mardani, Shahram Solaymani, Ali Arman, Fatemeh Hafezi, Azin Ahmadpourian, Sirvan Naderi, Khalil Saghi, Alia Méndez, Gabriel Trejo

Erschienen in: Optical and Quantum Electronics | Ausgabe 7/2017

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Abstract

Thin films of Ag/Cu were deposited by reactive DC magnetron sputtering on (001)-oriented Si and glass substrates for various deposition times (4–24 min). These films were characterized by atomic force microscopy (AFM), and a power law scaling was performed on the obtained micrographs to investigate the self-affine nature of the sample morphology, which is indicative of a fractal structure. We applied the Higuchi’s algorithm to the AFM data to determine the fractal dimension of each sample, and the Hurst exponents were computed. The deposition time dependences of these parameters and the grain size distributions estimated from the UV–visible spectra using the Mie theory, allowed us to describe a particle formation mechanism during the deposition process, in which the length of continuous paths of conductive particles increases as the deposition time is increased. In agreement with this explanation, the electrical resistance decreased with the increment of the deposition time.
Vorheriger Artikel High efficiency solar cells using quantum interferences
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Metadaten
Titel
Application of Mie theory and fractal models to determine the optical and surface roughness of Ag–Cu thin films
verfasst von
Ștefan Țălu
Ram Pratap Yadav
Ashok Kumar Mittal
Amine Achour
Carlos Luna
Mohsen Mardani
Shahram Solaymani
Ali Arman
Fatemeh Hafezi
Azin Ahmadpourian
Sirvan Naderi
Khalil Saghi
Alia Méndez
Gabriel Trejo
Publikationsdatum
01.07.2017
Verlag
Springer US
Erschienen in
Optical and Quantum Electronics / Ausgabe 7/2017
Print ISSN: 0306-8919
Elektronische ISSN: 1572-817X
DOI
https://doi.org/10.1007/s11082-017-1079-3

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