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Journal of Materials Engineering and Performance
Erschienen in: Journal of Materials Engineering and Performance 9/2014

01.09.2014

Tailoring the Microstructural, Optical, and Electrical Properties of Nanocrystalline WO3 Thin Films Using Al Doping

verfasst von: Ramnayan Mukherjee, C. S. Prajapati, P. P. Sahay

Erschienen in: Journal of Materials Engineering and Performance | Ausgabe 9/2014

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Abstract

We have studied the influence of Al doping on the microstructural, optical, and electrical properties of spray-deposited WO3 thin films. XRD analyses confirm that all the films are of polycrystalline WO3 in nature, possessing monoclinic structure. EDX profiles of the Al-doped films show aluminum peaks implying incorporation of Al ions into WO3 lattice. On Al doping, the average crystallite size decreases due to increase in the density of nucleation centers at the time of film growth. The observed variation in the lattice parameter values on Al doping is attributed to the incorporation of Al ions into WO3 lattice. Enhancement in the direct optical band gap compared to the undoped film has been observed on Al doping due to decrease in the width of allowed energy states near the conduction band edge. The refractive indices of the films follow the Cauchy relation of normal dispersion. Electrical resistivity compared to the undoped film has been found to increase on Al doping.
Vorheriger Artikel Preparation and Dielectric Properties of CaCu3Ti4O12 Ceramics with Different Additives
Nächster Artikel Production of High-Strength Al/Al2O3/WC Composite by Accumulative Roll Bonding

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Metadaten
Titel
Tailoring the Microstructural, Optical, and Electrical Properties of Nanocrystalline WO3 Thin Films Using Al Doping
verfasst von
Ramnayan Mukherjee
C. S. Prajapati
P. P. Sahay
Publikationsdatum
01.09.2014
Verlag
Springer US
Erschienen in
Journal of Materials Engineering and Performance / Ausgabe 9/2014
Print ISSN: 1059-9495
Elektronische ISSN: 1544-1024
DOI
https://doi.org/10.1007/s11665-014-1094-5

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