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Microsystem Technologies
Erschienen in: Microsystem Technologies 11/2015

01.11.2015 | Technical Paper

Model extraction of micromachined planar inductors implemented on alumina substrate

verfasst von: Teweldebrhan Kifle, Sudhir Chandra, S. K. Koul

Erschienen in: Microsystem Technologies | Ausgabe 11/2015

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Abstract

In this work, the high resistivity material property of Alumina substrate is made into use in order to minimize the substrate loss and thereby rendering of relatively high quality MEMS suspended inductors. The modified \(\pi \)-model is used in order to account the skin effect as well as exploit the frequency-dependent losses in the devices. On-wafer-measurements were made prior to characterization and model extraction. The maximum quality factor achieved is about 37.2 with inductor value 3.98 nH at 1.28 GHz. This result is quite promising and could be further enhanced by increasing the metal thickness.
Vorheriger Artikel Electromagnetic interference shielding properties of nanocomposites for commercial electronic devices
Nächster Artikel Modeling and fabrication studies of negative permeability metamaterial for use in waveguide applications

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Metadaten
Titel
Model extraction of micromachined planar inductors implemented on alumina substrate
verfasst von
Teweldebrhan Kifle
Sudhir Chandra
S. K. Koul
Publikationsdatum
01.11.2015
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 11/2015
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-015-2420-z

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