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Optical and Quantum Electronics

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01.10.2023

Morphology and multifractal characteristics of Ag–Cu films with N doping prepared by direct current magnetron sputtering method

verfasst von: Razia Noorbakhsh, Sahar Rezaee, Borhan Arghavani Nia, Arash Boochani

Erschienen in: Optical and Quantum Electronics | Ausgabe 10/2023

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Abstract

Nowadays, metal nanoparticles are one of the most important products of nanotechnology with wide applications in various industries, so researchers are looking to create alloy nanostructures with new structural and mechanical properties by combining these nanoparticles. Therefore, in this research, the surface morphology of nanometer silver–copper films doped with nitrogen impurity, prepared by direct current magnetic sputtering method at different time periods, was investigated with the help of atomic force microscope data. The statistical data obtained from the microscope demonstrated that the morphological properties of the films change with increasing sputtering time. By examining and analyzing the Δα parameter resulted from the f(α) diagram of the films, it was also found that the surface roughness of the films rises with the increase of the sputtering time, which could be due to the increase in the size of the particles owing to the growth method of the films.

Vorheriger Artikel First principles investigations on electronic and magnetic properties of Fe: SnO monolayer

Nächster Artikel A highly birefringent and compact nonlinear photonic crystal fiber for next-generation optical fiber applications: design and investigation

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Titel: Morphology and multifractal characteristics of Ag–Cu films with N doping prepared by direct current magnetron sputtering method
verfasst von: Razia Noorbakhsh
Sahar Rezaee
Borhan Arghavani Nia
Arash Boochani
Publikationsdatum: 01.10.2023
Verlag: Springer US
Erschienen in: Optical and Quantum Electronics / Ausgabe 10/2023
Print ISSN: 0306-8919
Elektronische ISSN: 1572-817X
DOI: https://doi.org/10.1007/s11082-023-05158-0

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