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2024 | OriginalPaper | Buchkapitel

Performance Estimation of Multilayer-Stack-Channel IGZO-Based Thin-Film Transistor in Double-Gate Mode

verfasst von : Shashi Kant Dargar, Abha Dargar, Shilpi Birla, V. Hima Deepthi

Erschienen in: Flexible Electronics for Electric Vehicles

Verlag: Springer Nature Singapore

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Abstract

Several additional amorphous oxide materials have been employed as promising materials in Thin-Film Transistor (TFT) applications due to their good transparency, resilience, and cost-effectiveness. However, due to low attainable mobility and low turn-on currents, the single-layer channel a-IGZO TFT is insufficient. To improve the switching characteristics of IGZO TFTs, this research suggests a multi-stack channel configuration. In this study, the source of performance enhancement in double-gate TFTs, compared to the Single-Gate (SG) multi-layer stack channel structure, has been described. Low mobility and Subthreshold Swing (SS) degradations occur in SG multi-layer stack channel TFTs. The field-effect mobility (FE) of SG TFTs (14.70 cm2/V-s) increases to 24.92 cm2/V-s when the gate voltage (VG = 10 V) is increased. From the channel’s top to the gate-insulator interface (1.3 × 1018 per cubic cm), the concentration of electrons in SG TFT declines gradually (1.86 × 1018 per cubic cm). The current density in the DG structure of the multi-stack channel drops from 7.5 A per cm2 to 2.5 A per cm2, leading to accumulation in the a-IGZO bulk and a large drain current. When the results from the proposed structure were compared to current results, they were found to be extremely encouraging and promising for future displays.

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Literatur
1.
Zurück zum Zitat Nomura K, Ohta H, Takagi A, Kamiya T, Hirano M, Hosono H (2004) Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors. Nature 432(7016):488–492CrossRef Nomura K, Ohta H, Takagi A, Kamiya T, Hirano M, Hosono H (2004) Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors. Nature 432(7016):488–492CrossRef
2.
Zurück zum Zitat Fortunato E, Barquinha P, Martins R (2012) Oxide semiconductor thin-film transistors: a review of recent advances. Adv Mater 24(22):2945–2986CrossRef Fortunato E, Barquinha P, Martins R (2012) Oxide semiconductor thin-film transistors: a review of recent advances. Adv Mater 24(22):2945–2986CrossRef
3.
Zurück zum Zitat Kamiya T, Nomura K, Hosono H (2010) Present status of amorphous In–Ga–Zn–O thin-film transistors. Sci Technol Adv Mater Kamiya T, Nomura K, Hosono H (2010) Present status of amorphous In–Ga–Zn–O thin-film transistors. Sci Technol Adv Mater
4.
Zurück zum Zitat Sheng J, Han KL, Hong T, Choi WH, Park JS (2018) Review of recent progresses on flexible oxide semiconductor thin film transistors based on atomic layer deposition processes. J Semicond 39(1):011008CrossRef Sheng J, Han KL, Hong T, Choi WH, Park JS (2018) Review of recent progresses on flexible oxide semiconductor thin film transistors based on atomic layer deposition processes. J Semicond 39(1):011008CrossRef
5.
Zurück zum Zitat Kim SI, Kim CJ, Park JC, Song I, Kim SW, Yin H, Lee E, Lee JC, Park Y (2008) High performance oxide thin film transistors with double active layers. In: 2008 IEEE international electron devices meeting, pp 1–4 Kim SI, Kim CJ, Park JC, Song I, Kim SW, Yin H, Lee E, Lee JC, Park Y (2008) High performance oxide thin film transistors with double active layers. In: 2008 IEEE international electron devices meeting, pp 1–4
6.
Zurück zum Zitat Park JS, Maeng WJ, Kim HS, Park JS (2012) Review of recent developments in amorphous oxide semiconductor thin-film transistor devices. Thin Solid Films 520(6):1679–1693CrossRef Park JS, Maeng WJ, Kim HS, Park JS (2012) Review of recent developments in amorphous oxide semiconductor thin-film transistor devices. Thin Solid Films 520(6):1679–1693CrossRef
7.
Zurück zum Zitat Dargar SK, Srivastava VM (2019) Design and analysis of novel tri-active layer channel amorphous-IGZO thin-film transistor. Micro & Nano Letters 14(13):1293–1297CrossRef Dargar SK, Srivastava VM (2019) Design and analysis of novel tri-active layer channel amorphous-IGZO thin-film transistor. Micro & Nano Letters 14(13):1293–1297CrossRef
8.
Zurück zum Zitat Dargar SK, Srivastava VM (2019) Design and analysis of IGZO thin film transistor for AMOLED pixel circuit using double-gate tri active layer channel. Heliyon 5(4):e01452CrossRef Dargar SK, Srivastava VM (2019) Design and analysis of IGZO thin film transistor for AMOLED pixel circuit using double-gate tri active layer channel. Heliyon 5(4):e01452CrossRef
9.
Zurück zum Zitat Dargar SK, Srivastava VM (2019) Double-gate tri-active layer channel amorphous-IGZO thin film transistor for AMLCD pixel circuit. In: 2019 photonics & electromagnetics research symposium-spring (PIERS-Spring), pp 2448–2453 Dargar SK, Srivastava VM (2019) Double-gate tri-active layer channel amorphous-IGZO thin film transistor for AMLCD pixel circuit. In: 2019 photonics & electromagnetics research symposium-spring (PIERS-Spring), pp 2448–2453
10.
Zurück zum Zitat Li X, Yin S, Xu D (2015) Simulation study on the active layer thickness and the interface of a-IGZO-TFT with double active layers. Front Optoelectron 8(4):445–450CrossRef Li X, Yin S, Xu D (2015) Simulation study on the active layer thickness and the interface of a-IGZO-TFT with double active layers. Front Optoelectron 8(4):445–450CrossRef
11.
Zurück zum Zitat Bae H, Choi H, Oh S, Kim DH, Bae J, Kim J, Kim YH, Kim DM (2012) Extraction technique for intrinsic Subgap DOS in a-IGZO TFTs by De-embedding the parasitic capacitance through the photonic C–V measurement. IEEE Electron Device Lett 34(1):57–59CrossRef Bae H, Choi H, Oh S, Kim DH, Bae J, Kim J, Kim YH, Kim DM (2012) Extraction technique for intrinsic Subgap DOS in a-IGZO TFTs by De-embedding the parasitic capacitance through the photonic CV measurement. IEEE Electron Device Lett 34(1):57–59CrossRef
12.
Zurück zum Zitat Bae M, Lee KM, Cho ES, Kwon HI, Kim DM, Kim DH (2013) Analytical current and capacitance models for amorphous indium-gallium-zinc-oxide thin-film transistors. IEEE Trans Electron Devices 60(10):3465–3473CrossRef Bae M, Lee KM, Cho ES, Kwon HI, Kim DM, Kim DH (2013) Analytical current and capacitance models for amorphous indium-gallium-zinc-oxide thin-film transistors. IEEE Trans Electron Devices 60(10):3465–3473CrossRef
13.
Zurück zum Zitat Kim Y, Kim S, Kim W, Bae M, Jeong HK, Kong D, Choi S, Kim DM, Kim DH (2012) Amorphous InGaZnO thin-film transistors—Part II: modeling and simulation of negative bias illumination stress-induced instability. IEEE Trans Electron Devices 59(10):2699–2706CrossRef Kim Y, Kim S, Kim W, Bae M, Jeong HK, Kong D, Choi S, Kim DM, Kim DH (2012) Amorphous InGaZnO thin-film transistors—Part II: modeling and simulation of negative bias illumination stress-induced instability. IEEE Trans Electron Devices 59(10):2699–2706CrossRef
14.
Zurück zum Zitat Bae M, Kim Y, Kong D, Jeong HK, Kim W, Kim J, Hur I, Kim DM, Kim DH (2011) Analytical models for drain current and gate capacitance in amorphous InGaZnO thin-film transistors with effective carrier density. IEEE Electron Device Lett 32(11):1546–1548CrossRef Bae M, Kim Y, Kong D, Jeong HK, Kim W, Kim J, Hur I, Kim DM, Kim DH (2011) Analytical models for drain current and gate capacitance in amorphous InGaZnO thin-film transistors with effective carrier density. IEEE Electron Device Lett 32(11):1546–1548CrossRef
15.
Zurück zum Zitat Kim HS, Park JS, Jeong HK, Son KS, Kim TS, Seon JB, Lee E, Chung JG, Kim DH, Ryu M, Lee SY (2012) Density of states-based design of metal oxide thin-film transistors for high mobility and superior photostability. ACS Appl Mater Interfaces 4(10):5416–5421CrossRef Kim HS, Park JS, Jeong HK, Son KS, Kim TS, Seon JB, Lee E, Chung JG, Kim DH, Ryu M, Lee SY (2012) Density of states-based design of metal oxide thin-film transistors for high mobility and superior photostability. ACS Appl Mater Interfaces 4(10):5416–5421CrossRef
16.
Zurück zum Zitat Fung TC, Chuang CS, Chen C, Abe K, Cottle R, Townsend M, Kumomi H, Kanicki J (2009) Two-dimensional numerical simulation of radio frequency sputter amorphous In–Ga–Zn–O thin-film transistors. J Appl Phys 106(8):084511CrossRef Fung TC, Chuang CS, Chen C, Abe K, Cottle R, Townsend M, Kumomi H, Kanicki J (2009) Two-dimensional numerical simulation of radio frequency sputter amorphous In–Ga–Zn–O thin-film transistors. J Appl Phys 106(8):084511CrossRef
17.
Zurück zum Zitat Chen BW, Eric KY, Chang TC, Kanicki J (2018) Physical origin of the non-linearity in amorphous In–Ga–Zn–O thin-film transistor current-voltage characteristics. Solid-State Electron 147:51–57CrossRef Chen BW, Eric KY, Chang TC, Kanicki J (2018) Physical origin of the non-linearity in amorphous In–Ga–Zn–O thin-film transistor current-voltage characteristics. Solid-State Electron 147:51–57CrossRef
18.
Zurück zum Zitat Dargar SK, Srivastava VM (2020) Design of double-gate tri-active layer channel based IGZO thin-film transistor for improved performance of ultra-low-power RFID rectifier. IEEE Access 8:194652–194662CrossRef Dargar SK, Srivastava VM (2020) Design of double-gate tri-active layer channel based IGZO thin-film transistor for improved performance of ultra-low-power RFID rectifier. IEEE Access 8:194652–194662CrossRef
19.
Zurück zum Zitat Rim YS, Chen H, Kou X, Duan HS, Zhou H, Cai M, Kim HJ, Yang Y (2014) Boost up mobility of solution-processed metal oxide thin-film transistors via confining structure on electron pathways. Adv Mater 26(25):4273–4278CrossRef Rim YS, Chen H, Kou X, Duan HS, Zhou H, Cai M, Kim HJ, Yang Y (2014) Boost up mobility of solution-processed metal oxide thin-film transistors via confining structure on electron pathways. Adv Mater 26(25):4273–4278CrossRef
20.
Zurück zum Zitat Baek G, Kanicki J (2012) Modeling of current—voltage characteristics for double-gate a-IGZO TFTs and its application to AMLCDs. J Soc Inform Display 20(5):237–244CrossRef Baek G, Kanicki J (2012) Modeling of current—voltage characteristics for double-gate a-IGZO TFTs and its application to AMLCDs. J Soc Inform Display 20(5):237–244CrossRef
21.
Zurück zum Zitat Ishida K, Meister T, Shabanpour R, Boroujeni BK, Carta C, Cantarella G, Petti L, Mtozenrieder N, Salvatore GA, Troster G, Ellinger F (2016) Radio frequency electronics in a-IGZO TFT technology. In: 2016 23rd international workshop on active-matrix flatpanel displays and devices (AM-FPD), pp 273–276 Ishida K, Meister T, Shabanpour R, Boroujeni BK, Carta C, Cantarella G, Petti L, Mtozenrieder N, Salvatore GA, Troster G, Ellinger F (2016) Radio frequency electronics in a-IGZO TFT technology. In: 2016 23rd international workshop on active-matrix flatpanel displays and devices (AM-FPD), pp 273–276
Metadaten
Titel
Performance Estimation of Multilayer-Stack-Channel IGZO-Based Thin-Film Transistor in Double-Gate Mode
verfasst von
Shashi Kant Dargar
Abha Dargar
Shilpi Birla
V. Hima Deepthi
Copyright-Jahr
2024
Verlag
Springer Nature Singapore
DOI
https://doi.org/10.1007/978-981-99-4795-9_8