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Journal of Nanoparticle Research

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01.01.2010 | Research Paper

Photoactivity passivation of TiO₂ nanoparticles using molecular layer deposited (MLD) polymer films

verfasst von: Xinhua Liang, Alan W. Weimer

Erschienen in: Journal of Nanoparticle Research | Ausgabe 1/2010

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Abstract

Pigment-grade anatase TiO₂ particles (160 nm) were passivated using ultra-thin insulating films deposited by molecular layer deposition (MLD). Trimethylaluminum (TMA) and ethylene glycol (E.G) were used as aluminum alkoxide (alucone) precursors in the temperature range of 100–160 °C. The growth rate varied from 0.5 nm/cycle at 100 °C to 0.35 nm/cycle at 160 °C. Methylene blue oxidation tests indicated that the photoactivity of pigment-grade TiO₂ particles was quenched after 20 cycles of alucone MLD film, which was comparable to 70 cycles of Al₂O₃ film deposited by atomic layer deposition (ALD). Alucone films would decompose in the presence of water at room temperature and would form a more stable composite containing aluminum, which decreased the passivation effect on the photoactivity of TiO₂ particles.

Vorheriger Artikel Pt nanoparticles supported over Ce–Ti–O: the solvothermal and photochemical approaches for the preparation of catalytic materials

Nächster Artikel Porous ZnO nanobelts: synthesis, mechanism, and morphological evolutions

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Titel: Photoactivity passivation of TiO2 nanoparticles using molecular layer deposited (MLD) polymer films
verfasst von: Xinhua Liang
Alan W. Weimer
Publikationsdatum: 01.01.2010
Verlag: Springer Netherlands
Erschienen in: Journal of Nanoparticle Research / Ausgabe 1/2010
Print ISSN: 1388-0764
Elektronische ISSN: 1572-896X
DOI: https://doi.org/10.1007/s11051-009-9587-0

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