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2014 | OriginalPaper | Buchkapitel

Rare Earth Implanted MOS Structures: Advantages and Drawbacks for Optoelectronic Applications

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Abstract

In this paper the advantages and drawbacks of rare earth-implanted MOS structures for optoelectronic applications are investigated. The discussion starts with a short overview of the electroluminescence properties and highlights the ambivalent role of hot electrons in these devises, namely the efficient excitation of rare earths ions and the efficient creation of defects. In addition, the defect shell model is addressed which explains the slight but continuous fading of the electroluminescence during device operation. Based on this, strategies for improving critical device parameters are discussed. The potential for voltage downscaling is not yet fully exploited but is generally limited by the extension of a dark zone in which the hot electrons do not yet have enough kinetic energy to excite rare earth ions. The most frequent strategies for enhancing the power efficiency comprise the increase of the excitation cross section by pumping via Si nanoclusters or via other rare earth ions. Finally, the discussion closes with the different possibilities to improve the operation lifetime, followed by a few remarks about potential applications.

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Literatur
1.
Zurück zum Zitat Wang, S., Eckau, A., Neufeld, E., et al.: Hot electron impact excitation cross-section of Er3+ and electroluminescence from erbium-implanted silicon metal-oxide-semiconductor tunnel diodes. Appl. Phys. Lett. 71, 2824–2826 (1997)CrossRef Wang, S., Eckau, A., Neufeld, E., et al.: Hot electron impact excitation cross-section of Er3+ and electroluminescence from erbium-implanted silicon metal-oxide-semiconductor tunnel diodes. Appl. Phys. Lett. 71, 2824–2826 (1997)CrossRef
2.
Zurück zum Zitat Kenyon, A.J.: Erbium in silicon. Semicond. Sci. Technol. 20, R65–R84 (2005)CrossRef Kenyon, A.J.: Erbium in silicon. Semicond. Sci. Technol. 20, R65–R84 (2005)CrossRef
3.
Zurück zum Zitat Jambois, O., Berencen, Y., Hijazi, K., et al.: Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions. J. Appl. Phys. 106, 063526 (2009)CrossRef Jambois, O., Berencen, Y., Hijazi, K., et al.: Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions. J. Appl. Phys. 106, 063526 (2009)CrossRef
4.
Zurück zum Zitat Saleh, B.E., Teich, M.C.: Fundamentals of Photonics. Wiley, Hoboken (2007) Saleh, B.E., Teich, M.C.: Fundamentals of Photonics. Wiley, Hoboken (2007)
5.
Zurück zum Zitat Sun, J.M., Skorupa, W., et al.: Efficient ultraviolet electroluminescence from a Gd-implanted silicon metal-oxide-semiconductor device. Appl. Phys. Lett. 85, 3387–3389 (2004)CrossRef Sun, J.M., Skorupa, W., et al.: Efficient ultraviolet electroluminescence from a Gd-implanted silicon metal-oxide-semiconductor device. Appl. Phys. Lett. 85, 3387–3389 (2004)CrossRef
6.
Zurück zum Zitat Skorupa, W., Sun, J.M., Prucnal, S. et al.: Rare earth ion implantation for silicon based light emission. In: Pichaud, B., Claverie, A., Alquier, D., Richter, H., Kittler, M. (eds.) Gettering and Defect Engineering in Semiconductor Technology Xi, pp. 755–760 (2005) Skorupa, W., Sun, J.M., Prucnal, S. et al.: Rare earth ion implantation for silicon based light emission. In: Pichaud, B., Claverie, A., Alquier, D., Richter, H., Kittler, M. (eds.) Gettering and Defect Engineering in Semiconductor Technology Xi, pp. 755–760 (2005)
7.
Zurück zum Zitat Yoshihara, M., Sekiya, A., et al.: Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition. J. Phys. D-Appl. Phys. 30, 1908–1912 (1997)CrossRef Yoshihara, M., Sekiya, A., et al.: Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition. J. Phys. D-Appl. Phys. 30, 1908–1912 (1997)CrossRef
8.
Zurück zum Zitat Wang, S., Amekura, H., Eckau, A., et al.: Luminescence from Er and Tb implanted into MOS tunnel diodes. Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. At. 148, 481–485 (1999)CrossRef Wang, S., Amekura, H., Eckau, A., et al.: Luminescence from Er and Tb implanted into MOS tunnel diodes. Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. At. 148, 481–485 (1999)CrossRef
9.
Zurück zum Zitat Sun, J.M., Skorupa, W., Dekorsy, T., et al.: Bright green electroluminescence from Tb3+ in silicon metal-oxide-semiconductor devices. J. Appl. Phys. 97, 123513 (2005)CrossRef Sun, J.M., Skorupa, W., Dekorsy, T., et al.: Bright green electroluminescence from Tb3+ in silicon metal-oxide-semiconductor devices. J. Appl. Phys. 97, 123513 (2005)CrossRef
10.
Zurück zum Zitat Prucnal, S., Sun, J.M., et al.: Switchable two-color electroluminescence based on a Si metal-oxide-semiconductor structure doped with Eu. Appl. Phys. Lett. 90, 181121 (2007)CrossRef Prucnal, S., Sun, J.M., et al.: Switchable two-color electroluminescence based on a Si metal-oxide-semiconductor structure doped with Eu. Appl. Phys. Lett. 90, 181121 (2007)CrossRef
11.
Zurück zum Zitat Rebohle, L., Wutzler, R., Germer, S. et al.: Er- and Nd-implanted MOS light emitting devices and their use for integrated photonic applications. In: Vivien, L., Honkanen, S.K., Pavesi, L., Pelli, S. (eds.) Silicon Photonics and Photonic Integrated Circuits III, pp. 3151–3153 (2012) Rebohle, L., Wutzler, R., Germer, S. et al.: Er- and Nd-implanted MOS light emitting devices and their use for integrated photonic applications. In: Vivien, L., Honkanen, S.K., Pavesi, L., Pelli, S. (eds.) Silicon Photonics and Photonic Integrated Circuits III, pp. 3151–3153 (2012)
12.
Zurück zum Zitat Dieke, G.H.: Spectra and Energy Levels of Rare Earth Ions in Crystals. Interscience Publ, New York (1968) Dieke, G.H.: Spectra and Energy Levels of Rare Earth Ions in Crystals. Interscience Publ, New York (1968)
13.
Zurück zum Zitat Liu, G., Jacquier, B.: Spectroscopic Properties of Rare Earths in Optical Materials. Springer, Berlin (2005) Liu, G., Jacquier, B.: Spectroscopic Properties of Rare Earths in Optical Materials. Springer, Berlin (2005)
14.
Zurück zum Zitat Germer, S., Cherkouk, C., Rebohle, L. et al.: Basic structures of integrated photonic circuits for smart biosensor applications. In: Proceedings of the SPIE 8774, Optical Sensors 2013, 87740P (2013) Germer, S., Cherkouk, C., Rebohle, L. et al.: Basic structures of integrated photonic circuits for smart biosensor applications. In: Proceedings of the SPIE 8774, Optical Sensors 2013, 87740P (2013)
15.
Zurück zum Zitat Prucnal, S., Sun, J.M., Muecklich, A., et al.: Flash lamp annealing versus rapid thermal and furnace annealing for optimized metal-oxide-silicon-based light-emitting diodes. Electrochem. Solid State Lett. 10, H50–H52 (2007)CrossRef Prucnal, S., Sun, J.M., Muecklich, A., et al.: Flash lamp annealing versus rapid thermal and furnace annealing for optimized metal-oxide-silicon-based light-emitting diodes. Electrochem. Solid State Lett. 10, H50–H52 (2007)CrossRef
16.
Zurück zum Zitat Sun, J.M., Prucnal, S., Skorupa, W., et al.: Electroluminescence properties of the Gd3+ ultraviolet luminescent centers in SiO2 gate oxide layers. J. Appl. Phys. 99, 103102 (2006)CrossRef Sun, J.M., Prucnal, S., Skorupa, W., et al.: Electroluminescence properties of the Gd3+ ultraviolet luminescent centers in SiO2 gate oxide layers. J. Appl. Phys. 99, 103102 (2006)CrossRef
17.
Zurück zum Zitat Rebohle, L., Skorupa, W.: Rare-Earth Implanted MOS Devices for Silicon Photonics: Microstructural, Electrical and Optoelectronic Properties. Springer, Berlin (2010)CrossRef Rebohle, L., Skorupa, W.: Rare-Earth Implanted MOS Devices for Silicon Photonics: Microstructural, Electrical and Optoelectronic Properties. Springer, Berlin (2010)CrossRef
18.
Zurück zum Zitat Rebohle, L., Lehmann, J., Prucnal, S., et al.: Physical limitations of the electroluminescence mechanism in terbium-based light emitters: matrix and layer thickness dependence. Appl. Phys. B-Lasers Opt. 98, 439–442 (2010)CrossRef Rebohle, L., Lehmann, J., Prucnal, S., et al.: Physical limitations of the electroluminescence mechanism in terbium-based light emitters: matrix and layer thickness dependence. Appl. Phys. B-Lasers Opt. 98, 439–442 (2010)CrossRef
19.
Zurück zum Zitat Wutzler, R.: Influence of Implantation and Annealing Conditions on the optoelectronic properties of Nd and Er doped MOS layers. Bachelor Thesis, Technical University Bergakademie Freiberg (2012) Wutzler, R.: Influence of Implantation and Annealing Conditions on the optoelectronic properties of Nd and Er doped MOS layers. Bachelor Thesis, Technical University Bergakademie Freiberg (2012)
20.
Zurück zum Zitat DiMaria, D.J., Cartier, E., Buchanan, D.A.: Anode hole injection and trapping in silicon dioxide. J. Appl. Phys. 80, 304–317 (1996)CrossRef DiMaria, D.J., Cartier, E., Buchanan, D.A.: Anode hole injection and trapping in silicon dioxide. J. Appl. Phys. 80, 304–317 (1996)CrossRef
21.
Zurück zum Zitat Sah, C.T., Sun, J.Y.C., Tzou, J.J.T.: Study of the atomic models of 3 donorlike defects in silicon metal-oxide-semiconductor structures from their gate material and process dependencies. J. Appl. Phys. 55, 1525–1545 (1984)CrossRef Sah, C.T., Sun, J.Y.C., Tzou, J.J.T.: Study of the atomic models of 3 donorlike defects in silicon metal-oxide-semiconductor structures from their gate material and process dependencies. J. Appl. Phys. 55, 1525–1545 (1984)CrossRef
22.
Zurück zum Zitat Stathis, J.H.: Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits. IEEE Trans. Device Mater. Reliab. 1, 43 (2001)CrossRef Stathis, J.H.: Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits. IEEE Trans. Device Mater. Reliab. 1, 43 (2001)CrossRef
23.
Zurück zum Zitat Nazarov, A.N., Tiagulskyi, S.I., Tyagulskyy, I.P., et al.: The effect of rare-earth clustering on charge trapping and electroluminescence in rare-earth implanted metal-oxide-semiconductor light-emitting devices. J. Appl. Phys. 107, 123112 (2010)CrossRef Nazarov, A.N., Tiagulskyi, S.I., Tyagulskyy, I.P., et al.: The effect of rare-earth clustering on charge trapping and electroluminescence in rare-earth implanted metal-oxide-semiconductor light-emitting devices. J. Appl. Phys. 107, 123112 (2010)CrossRef
24.
Zurück zum Zitat Tiagulskyi, S., Nazarov, A., Tyagulskii, I. et al.: Shell model for REOx nanoclusters in amorphous SiO2: charge trapping and electroluminescence quenching. In: Dappe, Y., Jelinek, P., Chab, V. (eds.) Physica Status Solidi C: Current Topics in Solid State Physics, vol 9, No 6. p 1468–1470 (2012) Tiagulskyi, S., Nazarov, A., Tyagulskii, I. et al.: Shell model for REOx nanoclusters in amorphous SiO2: charge trapping and electroluminescence quenching. In: Dappe, Y., Jelinek, P., Chab, V. (eds.) Physica Status Solidi C: Current Topics in Solid State Physics, vol 9, No 6. p 1468–1470 (2012)
25.
Zurück zum Zitat Nazarov, A., Osiyuk, I., Tyagulskii, I., et al.: Charge trapping phenomena in high-efficiency metal-oxide-silicon light-emitting diodes with ion-implanted oxide. J. Lumin. 121, 213–216 (2006)CrossRef Nazarov, A., Osiyuk, I., Tyagulskii, I., et al.: Charge trapping phenomena in high-efficiency metal-oxide-silicon light-emitting diodes with ion-implanted oxide. J. Lumin. 121, 213–216 (2006)CrossRef
26.
Zurück zum Zitat Prucnal, S., Rebohle, L., Nazarov, A.N., et al.: Reactivation of damaged rare earth luminescence centers in ion-implanted metal-oxide-silicon light emitting devices. Appl. Phys. B-Lasers Opt. 91, 123–126 (2008)CrossRef Prucnal, S., Rebohle, L., Nazarov, A.N., et al.: Reactivation of damaged rare earth luminescence centers in ion-implanted metal-oxide-silicon light emitting devices. Appl. Phys. B-Lasers Opt. 91, 123–126 (2008)CrossRef
27.
Zurück zum Zitat Arnold, D., Cartier, E., Dimaria, D.J.: Theory of high-field electron-transport and impact ionization in silicon dioxide. Phys. Rev. B 49, 10278–10297 (1994)CrossRef Arnold, D., Cartier, E., Dimaria, D.J.: Theory of high-field electron-transport and impact ionization in silicon dioxide. Phys. Rev. B 49, 10278–10297 (1994)CrossRef
28.
Zurück zum Zitat Dimaria, D.J., Fischetti, M.: Hot electron transport and trapping in silicon dioxide. In: Ferradini, C., Jay-Gerin, J.P. (eds.) Excess Electrons in Dielectric Media. CRC Press, Boca Raton, p. 315 (1991) Dimaria, D.J., Fischetti, M.: Hot electron transport and trapping in silicon dioxide. In: Ferradini, C., Jay-Gerin, J.P. (eds.) Excess Electrons in Dielectric Media. CRC Press, Boca Raton, p. 315 (1991)
29.
Zurück zum Zitat Kenyon, A.J., Trwoga, P.F., Federighi, M., et al.: Optical properties of PECVD erbium-doped silicon-rich silica—evidence for energy transfer between silicon microclusters and erbium ions. J. Phys. Condens. Matter 6, L319–L324 (1994)CrossRef Kenyon, A.J., Trwoga, P.F., Federighi, M., et al.: Optical properties of PECVD erbium-doped silicon-rich silica—evidence for energy transfer between silicon microclusters and erbium ions. J. Phys. Condens. Matter 6, L319–L324 (1994)CrossRef
30.
Zurück zum Zitat Nazarov, A., Sun, J.M., Skorupa, W., et al.: Light emission and charge trapping in Er-doped silicon dioxide films containing silicon nanocrystals. Appl. Phys. Lett. 86, 151914 (2005)CrossRef Nazarov, A., Sun, J.M., Skorupa, W., et al.: Light emission and charge trapping in Er-doped silicon dioxide films containing silicon nanocrystals. Appl. Phys. Lett. 86, 151914 (2005)CrossRef
31.
Zurück zum Zitat Franzo, G., Vinciguerra, V., Priolo, F.: Room-temperature luminescence from rare-earth ions implanted into Si nanocrystals. Philos. Mag. B 80, 719–728 (2000)CrossRef Franzo, G., Vinciguerra, V., Priolo, F.: Room-temperature luminescence from rare-earth ions implanted into Si nanocrystals. Philos. Mag. B 80, 719–728 (2000)CrossRef
32.
Zurück zum Zitat Franzo, G., Pecora, E., Priolo, F., et al.: Role of the Si excess on the excitation of Er doped SiOx. Appl. Phys. Lett. 90, 183102 (2007)CrossRef Franzo, G., Pecora, E., Priolo, F., et al.: Role of the Si excess on the excitation of Er doped SiOx. Appl. Phys. Lett. 90, 183102 (2007)CrossRef
33.
Zurück zum Zitat Iacona, F., Irrera, A., Franzo, G., et al.: Silicon-based light-emitting devices: properties and applications of crystalline, amorphous and Er-doped nanoclusters. IEEE J. Sel. Top. Quantum Electron. 12, 1596–1606 (2006)CrossRef Iacona, F., Irrera, A., Franzo, G., et al.: Silicon-based light-emitting devices: properties and applications of crystalline, amorphous and Er-doped nanoclusters. IEEE J. Sel. Top. Quantum Electron. 12, 1596–1606 (2006)CrossRef
34.
Zurück zum Zitat Priolo, F., Presti, C.D., Franzo, G., et al.: Carrier-induced quenching processes on the erbium luminescence in silicon nanocluster devices. Phys. Rev. B 73, 113302 (2006)CrossRef Priolo, F., Presti, C.D., Franzo, G., et al.: Carrier-induced quenching processes on the erbium luminescence in silicon nanocluster devices. Phys. Rev. B 73, 113302 (2006)CrossRef
35.
Zurück zum Zitat Sun, J.M., Prucnal, S., Skorupa, W., et al.: Increase of blue electroluminescence from Ce-doped SiO2 layers through sensitization by Gd3+ ions. Appl. Phys. Lett. 89, 091908 (2006)CrossRef Sun, J.M., Prucnal, S., Skorupa, W., et al.: Increase of blue electroluminescence from Ce-doped SiO2 layers through sensitization by Gd3+ ions. Appl. Phys. Lett. 89, 091908 (2006)CrossRef
36.
Zurück zum Zitat Prucnal, S., Sun, J.M., Rebohle, L. et al. (2007) Fourfold increase of the ultraviolet (314 nm) electroluminescence from SiO2 : Gd layers by fluorine coimplantation and flash lamp annealing. Applied Physics Letters 91: 181107 Prucnal, S., Sun, J.M., Rebohle, L. et al. (2007) Fourfold increase of the ultraviolet (314 nm) electroluminescence from SiO2 : Gd layers by fluorine coimplantation and flash lamp annealing. Applied Physics Letters 91: 181107
37.
Zurück zum Zitat Wright, P.J., Kasai, N., Inoue, S. et al.: Improvement in SiO2 gate dielectrics with fluorine incorporation. In: 1989 Symposium on VLSI Technology: Digest of Technical Papers: 51–52 (1989) Wright, P.J., Kasai, N., Inoue, S. et al.: Improvement in SiO2 gate dielectrics with fluorine incorporation. In: 1989 Symposium on VLSI Technology: Digest of Technical Papers: 51–52 (1989)
38.
Zurück zum Zitat McWilliams, K.P., Halle, L.F., Zietlow, T.C.: Improved hot-carrier resistance with fluorinated gate oxides. IEEE Electron. Device Lett. 11, 3–5 (1990)CrossRef McWilliams, K.P., Halle, L.F., Zietlow, T.C.: Improved hot-carrier resistance with fluorinated gate oxides. IEEE Electron. Device Lett. 11, 3–5 (1990)CrossRef
39.
Zurück zum Zitat Sun, J.M., Rebohle, L., Prucnal, S., et al.: Giant stability enhancement of rare-earth implanted SiO2 light emitting devices by an additional SiON protection layer. Appl. Phys. Lett. 92, 071103 (2008)CrossRef Sun, J.M., Rebohle, L., Prucnal, S., et al.: Giant stability enhancement of rare-earth implanted SiO2 light emitting devices by an additional SiON protection layer. Appl. Phys. Lett. 92, 071103 (2008)CrossRef
40.
Zurück zum Zitat Prucnal, S., Sun, J.M., Reuther, H., et al.: Strong improvement of the electroluminescence stability of SiO2: Gd layers by potassium co-implantation. Electrochem. Solid State Lett. 10, J30–J32 (2007)CrossRef Prucnal, S., Sun, J.M., Reuther, H., et al.: Strong improvement of the electroluminescence stability of SiO2: Gd layers by potassium co-implantation. Electrochem. Solid State Lett. 10, J30–J32 (2007)CrossRef
41.
Zurück zum Zitat Muscara, A., Castagna, M.E., Leonardi, S., et al.: Design and electro-optical characterization of Si-based resonant cavity light emitting devices. IEEE J. Quantum Electron. 47, 1362–1368 (2011)CrossRef Muscara, A., Castagna, M.E., Leonardi, S., et al.: Design and electro-optical characterization of Si-based resonant cavity light emitting devices. IEEE J. Quantum Electron. 47, 1362–1368 (2011)CrossRef
42.
Zurück zum Zitat Jambois, O., Ramirez, J.M., Berencen, Y., et al.: Effect of the annealing treatments on the electroluminescence efficiency of SiO2 layers doped with Si and Er. J. Phys. D-Appl. Phys. 45, 045103 (2012)CrossRef Jambois, O., Ramirez, J.M., Berencen, Y., et al.: Effect of the annealing treatments on the electroluminescence efficiency of SiO2 layers doped with Si and Er. J. Phys. D-Appl. Phys. 45, 045103 (2012)CrossRef
43.
Zurück zum Zitat Cueff, S., Labbe, C., Jambois, O., et al.: Structural factors impacting carrier transport and electroluminescence from Si nanocluster-sensitized Er ions. Opt. Express 20, 22490–22502 (2012)CrossRef Cueff, S., Labbe, C., Jambois, O., et al.: Structural factors impacting carrier transport and electroluminescence from Si nanocluster-sensitized Er ions. Opt. Express 20, 22490–22502 (2012)CrossRef
44.
Zurück zum Zitat Yerci, S., Li, R., Dal Negro, L.: Electroluminescence from Er-doped Si-rich silicon nitride light emitting diodes. Appl. Phys. Lett. 97, 081109 (2010)CrossRef Yerci, S., Li, R., Dal Negro, L.: Electroluminescence from Er-doped Si-rich silicon nitride light emitting diodes. Appl. Phys. Lett. 97, 081109 (2010)CrossRef
45.
Zurück zum Zitat Warga, J., Li, R., Basu, S.N., et al.: Erbium-doped silicon nanocrystals in silicon/silicon nitride superlattice structures: light emission and energy transfer. Physica E 41, 1040–1043 (2009)CrossRef Warga, J., Li, R., Basu, S.N., et al.: Erbium-doped silicon nanocrystals in silicon/silicon nitride superlattice structures: light emission and energy transfer. Physica E 41, 1040–1043 (2009)CrossRef
46.
Zurück zum Zitat Yin, Y., Xu, W.J., Ran, G.Z., et al.: Er3+ infrared photo- and electroluminescence from Er-doped Si-rich silicon nitride films with varying Si and Er content. Funct. Mater. Lett. 4, 255–259 (2011)CrossRef Yin, Y., Xu, W.J., Ran, G.Z., et al.: Er3+ infrared photo- and electroluminescence from Er-doped Si-rich silicon nitride films with varying Si and Er content. Funct. Mater. Lett. 4, 255–259 (2011)CrossRef
47.
Zurück zum Zitat Yin, Y., Xu, W.J., Wei, F., et al.: Room temperature Er3+ 1.54 µm electroluminescence from Si-rich erbium silicate deposited by magnetron sputtering. J. Phys. D-Appl. Phys. 43, 335102 (2010)CrossRef Yin, Y., Xu, W.J., Wei, F., et al.: Room temperature Er3+ 1.54 µm electroluminescence from Si-rich erbium silicate deposited by magnetron sputtering. J. Phys. D-Appl. Phys. 43, 335102 (2010)CrossRef
48.
Zurück zum Zitat Irrera, A., Galli, M., Miritello, M., et al.: New approaches for enhancing light emission from Er-based materials and devices. Physica E 41, 891–898 (2009)CrossRef Irrera, A., Galli, M., Miritello, M., et al.: New approaches for enhancing light emission from Er-based materials and devices. Physica E 41, 891–898 (2009)CrossRef
49.
Zurück zum Zitat Halioua, Y., Bazin, A., Monnier, P., et al.: Hybrid III–V semiconductor/silicon nanolaser. Opt. Express 19, 9221–9231 (2011)CrossRef Halioua, Y., Bazin, A., Monnier, P., et al.: Hybrid III–V semiconductor/silicon nanolaser. Opt. Express 19, 9221–9231 (2011)CrossRef
50.
Zurück zum Zitat Ramuz, M., Burgi, L., Stanley, R., et al.: Coupling light from an organic light emitting diode (OLED) into a single-mode waveguide: Toward monolithically integrated optical sensors. J. Appl. Phys. 105, 084508 (2009)CrossRef Ramuz, M., Burgi, L., Stanley, R., et al.: Coupling light from an organic light emitting diode (OLED) into a single-mode waveguide: Toward monolithically integrated optical sensors. J. Appl. Phys. 105, 084508 (2009)CrossRef
51.
Zurück zum Zitat Yamada, A., Sakuraba, M., Murota, J.: Photo detection characteristics of Si/Si1-xGex/Si p-i-n diodes integrated with optical waveguides. Thin Solid Films 508, 399–401 (2006)CrossRef Yamada, A., Sakuraba, M., Murota, J.: Photo detection characteristics of Si/Si1-xGex/Si p-i-n diodes integrated with optical waveguides. Thin Solid Films 508, 399–401 (2006)CrossRef
52.
Zurück zum Zitat Miller, G.M., Briggs, R.M., Atwater, H.A.: Achieving optical gain in waveguide-confined nanocluster-sensitized erbium by pulsed excitation. J. Appl. Phys. 108, 063109 (2010)CrossRef Miller, G.M., Briggs, R.M., Atwater, H.A.: Achieving optical gain in waveguide-confined nanocluster-sensitized erbium by pulsed excitation. J. Appl. Phys. 108, 063109 (2010)CrossRef
53.
Zurück zum Zitat Ramirez, J.M., Lupi, F.F., Berencen, Y., et al.: Er-doped light emitting slot waveguides monolithically integrated in a silicon photonic chip. Nanotechnology 24, 115202 (2013)CrossRef Ramirez, J.M., Lupi, F.F., Berencen, Y., et al.: Er-doped light emitting slot waveguides monolithically integrated in a silicon photonic chip. Nanotechnology 24, 115202 (2013)CrossRef
54.
Zurück zum Zitat Tengattini, A., Gandolfi, D., Prtljaga, N., et al.: Toward a 1.54 µm electrically driven erbium-doped silicon slot waveguide and optical amplifier. J. Lightwave Technol. 31, 391–397 (2013)CrossRef Tengattini, A., Gandolfi, D., Prtljaga, N., et al.: Toward a 1.54 µm electrically driven erbium-doped silicon slot waveguide and optical amplifier. J. Lightwave Technol. 31, 391–397 (2013)CrossRef
Metadaten
Titel
Rare Earth Implanted MOS Structures: Advantages and Drawbacks for Optoelectronic Applications
verfasst von
Lars Rebohle
Copyright-Jahr
2014
DOI
https://doi.org/10.1007/978-3-319-08804-4_16

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