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Erschienen in: Journal of Materials Science: Materials in Electronics 11/2024

01.04.2024

Significant advancements in passivating crystalline silicon surfaces achieved through the implementation of metal-doped zinc oxide layers

verfasst von: M. Salem, A. Haouas, H. Ghannam, A. Almohammedi, I. Massoudi

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 11/2024

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Abstract

A thorough investigation was undertaken to compare ZnO nanostructured films doped with transition metals (M = Fe, Cu, and Cr) and their functional characteristics, with a specific focus on their potential applications in passivating silicon (Si) solar cells. Through a co-precipitation and spin coating process, both pure and M-doped ZnO nanostructured films were synthesized. Structural analyses revealed the presence of hexagonal wurtzite formation in all films. Reflectivity and lifetime measurements indicated an improvement in both parameters for doped ZnO on Si surfaces. Photocurrent density measurements exhibited a range from 2.5 µA/cm² for pristine ZnO to 25, 8, and 19 µA/cm² for Fe, Cu, and Cr-doped samples, respectively, showcasing distinct variations in performance. These compelling results position the coated layers as promising candidates for cutting-edge optoelectronic applications.

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Metadaten
Titel
Significant advancements in passivating crystalline silicon surfaces achieved through the implementation of metal-doped zinc oxide layers
verfasst von
M. Salem
A. Haouas
H. Ghannam
A. Almohammedi
I. Massoudi
Publikationsdatum
01.04.2024
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 11/2024
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-024-12550-3

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