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Erschienen in: Optical and Quantum Electronics 2/2024

01.02.2024

Synthesis and study of photoelectrochromic and photocatalytic behavior of double-layer N-doped TiO2/Co3O4 configuration via DC reactive magnetron sputtering

verfasst von: Firas J. Kadhim, Noor Alhuda H. Hashim, Zinah S. Abdulsattar

Erschienen in: Optical and Quantum Electronics | Ausgabe 2/2024

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Abstract

This work introduces the synthesis and the characterization of N-doped TiO2 and Co3O4 thin films prepared via DC reactive magnetron sputtering technique. N-doped TiO2 thin films was deposited on indium-tin oxide (ITO) conducting substrate at different nitrogen ratios, then the Co3O4 thin film was deposited onto the N-doped TiO2 layer to synthesize a double-layer TiO2-N/Co3O4 Photoelectrochromic device. Several techniques were used to characterize the produces which are x-ray diffraction (XRD), field emission-scanning electron microscopy (FE-SEM), Fourier-transform infrared (FTIR) spectroscopy and UV–Vis spectroscopy. The Photoelectrochromic device was characterized by UV–Vis spectroscopy and the results show that the double-layer N-doped TiO2 /Co3O4 was sensitive to light, that’s due to the photogenerated holes in the valence band of photocatalyst (N-doped TiO2) and led to direct electron transfer from Co3O4 to N-doped TiO2 layer.The optical transmittance modulation \(\Delta T={T}_{b}- {T}_{c}\) was 27.1% after 2.5 h irradiation by xenon light.

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Metadaten
Titel
Synthesis and study of photoelectrochromic and photocatalytic behavior of double-layer N-doped TiO2/Co3O4 configuration via DC reactive magnetron sputtering
verfasst von
Firas J. Kadhim
Noor Alhuda H. Hashim
Zinah S. Abdulsattar
Publikationsdatum
01.02.2024
Verlag
Springer US
Erschienen in
Optical and Quantum Electronics / Ausgabe 2/2024
Print ISSN: 0306-8919
Elektronische ISSN: 1572-817X
DOI
https://doi.org/10.1007/s11082-023-05696-7

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