Skip to main content
Erschienen in: Journal of Computational Electronics 2/2016

02.08.2015

A comprehensive study of bipolar operation in resistive switching memory devices

verfasst von: Dan Berco, Tseung-Yuen Tseng

Erschienen in: Journal of Computational Electronics | Ausgabe 2/2016

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

The authors present a new numerical analysis method to investigate the conduction filament dynamics of a resistive switching nonvolatile metal–insulator–metal structured memory device. This comprehensive method, utilizing the Gibbs free energy criteria as a leading indicator and allowing simulation of all resistive memory operational phases (forming, set and reset), is presented for the first time. The formation and rupture of an oxygen vacancies based conduction filament are simulated to demonstrate a cycle of operation in a hafnium oxide based resistive forming layer. Starting from a random initial distribution of defect states, on to a formed conduction filament and ending in a ruptured state. Detailed plots of the physical parameters within the resistive layer are provided to gain deeper understanding of the conduction filament kinetics and introduce the concept of “hot spots”, referring to random localized initial agglomeration of oxygen vacancies in which temperature surges is favored and contribute to initiate the conductive filament formation. By basing the method on well known thermodynamic properties and the Metropolis algorithm, simulation reliability and efficiency are obtained. The presented results confirm previously published data demonstrating the switching characteristics of hafnium based resistive random access memory.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Fußnoten
1
The 3D schematic illustration is provided as a visualization aid for the 2D model used in this work.
 
2
The interfacial layer representation is not plotted to scale and is provided herein for illustrative purposes to help visualize the oxygen reservoir data structure.
 
Literatur
1.
Zurück zum Zitat Tseng, T.Y., Sze, S.M.: An introduction to nonvolatile memories. In: Tseng, T.Y., Sze, S.M. (eds.) Nonvolatile Memories: Materials, Devices, and Applications, pp. 1–9. American Scientific Publishers, Lewis Way (2012) Tseng, T.Y., Sze, S.M.: An introduction to nonvolatile memories. In: Tseng, T.Y., Sze, S.M. (eds.) Nonvolatile Memories: Materials, Devices, and Applications, pp. 1–9. American Scientific Publishers, Lewis Way (2012)
3.
Zurück zum Zitat Yu, S., Guan, X., Wong, H.-S.P.: Understanding metal oxide RRAM current overshoot and reliability using kinetic Monte Carlo simulation. IEDM, pp. 26.1.1–26.1.4 (2012). doi:10.1109/IEDM.2012.6479105 Yu, S., Guan, X., Wong, H.-S.P.: Understanding metal oxide RRAM current overshoot and reliability using kinetic Monte Carlo simulation. IEDM, pp. 26.1.1–26.1.4 (2012). doi:10.​1109/​IEDM.​2012.​6479105
4.
Zurück zum Zitat Yu, S., Guan, X., Wong, H.S.P.: On the stochastic nature of resistive switching in metal oxide RRAM: physical modeling, Monte Carlo simulation, and experimental characterization. IEDM, pp. 17.3.1–17.3.4, (2011). doi:10.1109/IEDM.2011.6131572 Yu, S., Guan, X., Wong, H.S.P.: On the stochastic nature of resistive switching in metal oxide RRAM: physical modeling, Monte Carlo simulation, and experimental characterization. IEDM, pp. 17.3.1–17.3.4, (2011). doi:10.​1109/​IEDM.​2011.​6131572
5.
Zurück zum Zitat Lee, J.S., Lee, S.B., Chang, S.H., Gao, L.G., Kang, B.S., Lee, M.-J., Kim, C.J., Noh, T.W., Kahng, B.: Scaling theory for unipolar resistance switching. Phys. Rev. Lett. 105(20), 205701 (2010)CrossRef Lee, J.S., Lee, S.B., Chang, S.H., Gao, L.G., Kang, B.S., Lee, M.-J., Kim, C.J., Noh, T.W., Kahng, B.: Scaling theory for unipolar resistance switching. Phys. Rev. Lett. 105(20), 205701 (2010)CrossRef
6.
Zurück zum Zitat Guan, X., Yu, S., Wong, H.-S.P.: On the switching parameter variation of metal oxide RRAM–Part I: Physical modeling and simulation methodology. IEEE Trans. Electron Devices 59(4), 1172–1182 (2012) Guan, X., Yu, S., Wong, H.-S.P.: On the switching parameter variation of metal oxide RRAM–Part I: Physical modeling and simulation methodology. IEEE Trans. Electron Devices 59(4), 1172–1182 (2012)
7.
Zurück zum Zitat Huang, P., Liu, X.Y., Chen, B., Li, H.T., Wang, Y.J., Deng, Y.X., Wei, K.L., Zeng, L., Gao, B., Du, G., Zhang, X., Kang, J.F.: A physics-based compact model of metal-oxide-based RRAM DC and AC operations. IEEE Trans. Electron Devices 60(12), 4090–4097 (2013). doi:10.1109/TED.2013.2287755 CrossRef Huang, P., Liu, X.Y., Chen, B., Li, H.T., Wang, Y.J., Deng, Y.X., Wei, K.L., Zeng, L., Gao, B., Du, G., Zhang, X., Kang, J.F.: A physics-based compact model of metal-oxide-based RRAM DC and AC operations. IEEE Trans. Electron Devices 60(12), 4090–4097 (2013). doi:10.​1109/​TED.​2013.​2287755 CrossRef
8.
Zurück zum Zitat Larentis, S., Nardi, F., Balatti, S., Gilmer, D.C., Ielmini, D.: Resistive switching by voltage-driven ion migration in bipolar RRAM—Part II: Modeling. IEEE Trans. Electron Devices 59(9), 2468–2475 (2012). doi:10.1109/TED.2012.2202320 CrossRef Larentis, S., Nardi, F., Balatti, S., Gilmer, D.C., Ielmini, D.: Resistive switching by voltage-driven ion migration in bipolar RRAM—Part II: Modeling. IEEE Trans. Electron Devices 59(9), 2468–2475 (2012). doi:10.​1109/​TED.​2012.​2202320 CrossRef
9.
Zurück zum Zitat Landau, D.P., Binder, K.: A Guide to Monte Carlo Simulations in Statistical Physics. Cambridge University Press, Cambridge (2000)MATH Landau, D.P., Binder, K.: A Guide to Monte Carlo Simulations in Statistical Physics. Cambridge University Press, Cambridge (2000)MATH
10.
Zurück zum Zitat Ielmini, D.: Modeling the universal set/reset characteristics of bipolar RRAM by field- and temperature-driven filament growth. IEEE Trans. Electron Devices 58(12), 4309–4317 (2011). doi:10.1109/TED.2011.2167513 CrossRef Ielmini, D.: Modeling the universal set/reset characteristics of bipolar RRAM by field- and temperature-driven filament growth. IEEE Trans. Electron Devices 58(12), 4309–4317 (2011). doi:10.​1109/​TED.​2011.​2167513 CrossRef
11.
Zurück zum Zitat Park, S.G., Magyari-Kope, B., Nishi, Y.: Impact of oxygen vacancy ordering on the formation of a conductive filament in \({\rm {TiO}}_{2}\) for resistive switching memory. IEEE Electron Device Lett. 32(2), 197–199 (2011). doi:10.1109/LED.2010.2091489 CrossRef Park, S.G., Magyari-Kope, B., Nishi, Y.: Impact of oxygen vacancy ordering on the formation of a conductive filament in \({\rm {TiO}}_{2}\) for resistive switching memory. IEEE Electron Device Lett. 32(2), 197–199 (2011). doi:10.​1109/​LED.​2010.​2091489 CrossRef
12.
Zurück zum Zitat Milosevic, N.D., Maglic, K.D.: Thermophysical properties of solid phase hafnium at high temperatures. Int. J. Thermophys. 27(2), 530–553 (2006)CrossRef Milosevic, N.D., Maglic, K.D.: Thermophysical properties of solid phase hafnium at high temperatures. Int. J. Thermophys. 27(2), 530–553 (2006)CrossRef
13.
Zurück zum Zitat Lee, J., Shin, J., Lee, D., Lee, W., Jung, S., Jo, M., Park, J., Biju, K.P., Kim, S., Park, S., Hwang, H.: Diode-less nano-scale ZrOx/HfOx RRAM device with excellent switching uniformity and reliability for high-density cross-point memory applications. IEDM Tech. Dig., pp. 452–455 (2010) Lee, J., Shin, J., Lee, D., Lee, W., Jung, S., Jo, M., Park, J., Biju, K.P., Kim, S., Park, S., Hwang, H.: Diode-less nano-scale ZrOx/HfOx RRAM device with excellent switching uniformity and reliability for high-density cross-point memory applications. IEDM Tech. Dig., pp. 452–455 (2010)
14.
Zurück zum Zitat Kim, W., Park, S.I., Zhang, Z., Yang-Liauw, Y., Sekar, D., Wong, H.-S.P., Wong, S.: Forming-free nitrogen-doped AlOx RRAM with sub-uA programming current. In: VLSI Symp. Tech. Dig., pp. 22–23 (2011) Kim, W., Park, S.I., Zhang, Z., Yang-Liauw, Y., Sekar, D., Wong, H.-S.P., Wong, S.: Forming-free nitrogen-doped AlOx RRAM with sub-uA programming current. In: VLSI Symp. Tech. Dig., pp. 22–23 (2011)
15.
Zurück zum Zitat Mott, N.F.: Metal-Insulator Transitions. Taylor & Francis, London (1974) Mott, N.F.: Metal-Insulator Transitions. Taylor & Francis, London (1974)
17.
Zurück zum Zitat Reed, T.B.: Free Energy of Formation of Binary Compounds. MIT Press, Cambridge (1971) Reed, T.B.: Free Energy of Formation of Binary Compounds. MIT Press, Cambridge (1971)
18.
Zurück zum Zitat Rosa, C.J.: Oxygen diffusion in alpha and beta titanium. Metall. Trans. 1, 2517–2522 (1970) Rosa, C.J.: Oxygen diffusion in alpha and beta titanium. Metall. Trans. 1, 2517–2522 (1970)
20.
Zurück zum Zitat Shima, H., Akinaga, H.: Basics of RRAM based on transition metal oxides. In: SEMATECH, International Symposium on Advanced Gate Stack Technology, October 2010 Shima, H., Akinaga, H.: Basics of RRAM based on transition metal oxides. In: SEMATECH, International Symposium on Advanced Gate Stack Technology, October 2010
21.
Zurück zum Zitat Guan, X., Yu, S., Wong, H.-S.P.: On the switching parameter variation of metal oxide RRAM—Part II: Model corroboration and device design strategy. IEEE Trans. Electron Devices 59(4), 1183–1188 (2012). doi:10.1109/TED.2012.2184544 CrossRef Guan, X., Yu, S., Wong, H.-S.P.: On the switching parameter variation of metal oxide RRAM—Part II: Model corroboration and device design strategy. IEEE Trans. Electron Devices 59(4), 1183–1188 (2012). doi:10.​1109/​TED.​2012.​2184544 CrossRef
Metadaten
Titel
A comprehensive study of bipolar operation in resistive switching memory devices
verfasst von
Dan Berco
Tseung-Yuen Tseng
Publikationsdatum
02.08.2015
Verlag
Springer US
Erschienen in
Journal of Computational Electronics / Ausgabe 2/2016
Print ISSN: 1569-8025
Elektronische ISSN: 1572-8137
DOI
https://doi.org/10.1007/s10825-015-0736-7

Weitere Artikel der Ausgabe 2/2016

Journal of Computational Electronics 2/2016 Zur Ausgabe

Neuer Inhalt