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Arabian Journal for Science and Engineering
Erschienen in: Arabian Journal for Science and Engineering 2/2020

28.10.2019 | Research Article - Mechanical Engineering

Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAlN Coatings

verfasst von: Soham Das, Ranjan Ghadai, Spandan Guha, Ashis Sharma, Bibhu P. Swain

Erschienen in: Arabian Journal for Science and Engineering | Ausgabe 2/2020

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Abstract

Titanium aluminum nitride (TiAlN) thin films were synthesized with different N2 flow rate on p-type Si (100) substrate and characterized by FESEM, AFM, XRD and nanoindentation to investigate the morphology, structural and mechanical properties. The FESEM images revealed non-uniform grain distribution with a higher degree of pores with the increase in N2 flow rate. The XRD data indicated the presence of AlN, TiAlN, Al2O3 dominant phases at 33.07°, 55.5°, 61.79° and 47.84°, 54.67° diffraction angles attributed to (100), (220) and (400), (112) diffraction plane, respectively. The AFM images revealed the average roughness as 36.9 nm for 30 sccm N2 flow rate. Furthermore, the mechanical properties such as H, E, plasticity index (H/E) and deformation to plastic resistance (H3/E2) of TiAlN thin film were found to be 21 GPa, 400 GPa, 0.094 and 0.318 GPa, respectively, indicating higher resistance to crack with increasing N2 flow rate.
Vorheriger Artikel Effect of Various Evaluation Criteria on Heat Transfer Enhancement of Nanofluids: A Case Study of Water-Based Cu2O Nanofluids
Nächster Artikel Thermal Response of an Orthotropic Non-charring Ablative Material

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Metadaten
Titel
Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAlN Coatings
verfasst von
Soham Das
Ranjan Ghadai
Spandan Guha
Ashis Sharma
Bibhu P. Swain
Publikationsdatum
28.10.2019
Verlag
Springer Berlin Heidelberg
Erschienen in
Arabian Journal for Science and Engineering / Ausgabe 2/2020
Print ISSN: 2193-567X
Elektronische ISSN: 2191-4281
DOI
https://doi.org/10.1007/s13369-019-04202-0

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