Effects of annealing on thermoelectric properties of Sb₂Te₃ thin films prepared by radio frequency magnetron sputtering

Antimony telluride (Sb₂Te₃) thin films were deposited on silicon substrates at room temperature (300 K) by radio frequency magnetron sputtering method. The effects of annealing in N₂ atmosphere on their thermoelectric properties were investigated. The microstructure and composition of these films were characterized using scanning electron microscopy, energy dispersive X-ray spectroscopy and X-ray diffraction, respectively. The electrical transport properties of the thin films, in terms of electrical conductivity and Seebeck coefficient were determined at room temperature. The carrier concentration and mobility were calculated from the Hall coefficient measurement. Both of the Seebeck coefficient and Hall coefficient measurement showed that the prepared Sb₂Te₃ thin films were p-type semiconductor materials. By optimizing the annealing temperature, the power factor achieved a maximum value of 18.02 μW cm⁻¹ K⁻² when the annealing temperature was increased to 523 K for 6 h with a maximum electrical conductivity (1.17 × 10³ S/cm) and moderate Seebeck coefficient (123.9 μV/K).