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Erschienen in: Journal of Materials Science: Materials in Electronics 20/2019

17.09.2019

Influence of Al2O3 nanoparticles incorporation on the dielectric properties of solution processed PVA films for organic field effect transistor applications

verfasst von: Betül Canimkurbey, Çiğdem Çakirlar, Selin Piravadili Mucur, Muhammad Yasin, Savaş Berber

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 20/2019

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Abstract

We report, the influence of Al2O3 nanoparticles (NP) incorporation on the dielectric properties of solution processed polyvinylalcohol (PVA) films for organic field effect transistor applications. It was observed typical p-type organic field effect transistors. Devices processed using employing PVA films blended with 70 wt% of Al2O3 NP as gate dielectric layers demonstrated higher field effect mobility, better saturation behavior and reduced hysteresis phenomenon compared to the devices based on pure PVA films. Al2O3 NP:PVA blends based dielectric films with 0, 3, 5, 10, 20, 50 and 70 wt% concentrations of Al2O3 NP compared to the weight of PVA were prepared. Dielectric parameters such as dielectric constant and dielectric strength of the Al2O3 NP:PVA films were analyzed. It was found that real dielectric constant as well as dielectric strength of the films increase with increase of Al2O3 NP concentration. Cole–Cole plots of the films demonstrated depressed semi-circles which points non-Debye type behavior. We presume that the devices being investigated with promising results, may be utilized for some industrial applications such as large area sensor arrays in future.

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Metadaten
Titel
Influence of Al2O3 nanoparticles incorporation on the dielectric properties of solution processed PVA films for organic field effect transistor applications
verfasst von
Betül Canimkurbey
Çiğdem Çakirlar
Selin Piravadili Mucur
Muhammad Yasin
Savaş Berber
Publikationsdatum
17.09.2019
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 20/2019
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-019-02192-1

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