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Journal of Materials Science: Materials in Electronics
Erschienen in: Journal of Materials Science: Materials in Electronics 18/2021

24.08.2021

Ion-beam lithography for fabrication of diffractive optical phase elements in silver-ion-exchanged glasses

verfasst von: Arashmid Nahal, Seyed Reza Hosseini, Masoud Mahjour-Shafiei

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 18/2021

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Abstract

In the present article, ion-beam lithography in ion-exchanged glasses is used as a method for the fabrication of miniaturized phase optical diffractive elements. It is established that, as a result of the interaction of a low-energy (∼ 40 keV) He+ ion beam with silver-ion-exchanged glasses, the index of refraction of interacted area increases. In the interacted areas of the samples, the formation of neutral silver nanoparticles leads to an increase in the index of refraction. This paves the way to employ such material to produce optical phase diffractive elements such as slits, gratings, or Fresnel’s zone plates. It is found that a remarkable dispersion for the index of refraction (n = n(λ)) gives rise to the dependence of diffraction efficiency of produced elements to the wavelength of the probe beams. The produced elements are of good quality, optically effective, chemically stable, waterproof, and scratch resistant.
Vorheriger Artikel Structural, double Jonscher response and non-Debye-type relaxor behavior of Ba0.75Sr0.25Ti0.9Zn0.2O3 ceramic
Nächster Artikel Structure and magnetic properties of Mn-doped SnS2 nanopowders prepared by hydrothermal method

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Metadaten
Titel
Ion-beam lithography for fabrication of diffractive optical phase elements in silver-ion-exchanged glasses
verfasst von
Arashmid Nahal
Seyed Reza Hosseini
Masoud Mahjour-Shafiei
Publikationsdatum
24.08.2021
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 18/2021
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-021-06819-0

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