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Polymer Bulletin
Erschienen in: Polymer Bulletin 3/2015

01.03.2015 | Original Paper

Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist

Erschienen in: Polymer Bulletin | Ausgabe 3/2015

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Abstract

A series of novel branched methacrylate copolymers (BPMBMV) were synthesized via the mercapto chain transfer polymerization using methacrylic acid, maleic anhydride, benzyl methacrylate, and 4-vinyl benzyl thiol. Then, BPMBMV reacted with hydroxyethyl acrylate to obtain branched UV-curable copolymer H-BPMBMV, which were characterized by fourier transfer infrared spectra and proton nuclear magnetic resonance spectra. The molecular weights and glass transition temperature (T g ) of the polymers decreased with the addition of VBT. The results of photo-differential scanning calorimetry (Photo-DSC) tests showed that photo-polymerization ability of H-BPMBMV increased with the increased content of VBT. With an optimized formulation, a negative-type photoresist was prepared. The resolution of the circuit could reach as high as 20 μm, and the film of photoresist showed good acid resistance.
Vorheriger Artikel Glass transition temperature control by poly(norbornene-dicarboximide) copolymers
Nächster Artikel Water-soluble polyelectrolyte in conjunction with membrane systems: modeling and simulation of retention profiles from washing method

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Metadaten
Titel
Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist
Publikationsdatum
01.03.2015
Erschienen in
Polymer Bulletin / Ausgabe 3/2015
Print ISSN: 0170-0839
Elektronische ISSN: 1436-2449
DOI
https://doi.org/10.1007/s00289-014-1289-9

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