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Journal of Materials Science
Erschienen in: Journal of Materials Science 1/2019

31.08.2018 | Energy materials

MoO3/BiVO4 heterojunction film with oxygen vacancies for efficient and stable photoelectrochemical water oxidation

verfasst von: Yaqi Chen, Minji Yang, Jinyan Du, Gaili Ke, Xiaohui Zhong, Yong Zhou, Faqin Dong, Liang Bian, Huichao He

Erschienen in: Journal of Materials Science | Ausgabe 1/2019

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Abstract

Poor charge transfer and separation rate are the major bottlenecks for the activity and stability of BiVO4 photoanode. Here, we introduced oxygen vacancies into MoO3/BiVO4 heterojunction film by post-annealing the film in argon-saturated environment for improving its photoelectrochemical (PEC) water oxidation activity and stability. In comparison with the normal MoO3/BiVO4 film, the MoO3/BiVO4 film with oxygen vacancies is of better PEC water oxidation performance. Specifically, a higher photocurrent density of 4.1 mA/cm2 in 0.1 M Na2SO4 at 1.1 V versus SCE was achieved on the MoO3/BiVO4 film with oxygen vacancies, which is about 200% improved over the normal MoO3/BiVO4 film (1.83 mA cm−2, at 1.1 V versus SCE). In addition, the MoO3/BiVO4 film with oxygen vacancies shows more stable activity and faster kinetics for water oxidation, without significant activity loss for 5 h reaction at 1.23 V versus RHE. The enhanced performance on such a MoO3/BiVO4 film photoanode can be attributed to that the oxygen vacancies accelerate the charge transfer and separation rate between film/electrolyte interface, and thus improve the water oxidation activity and restrain the anodic photocorrosion simultaneously.
Vorheriger Artikel The effect of fast and slow surface states on photoelectrochemical performance of hematite photoanodes fabricated by electrodeposition and hydrothermal methods
Nächster Artikel CaO impregnated highly porous honeycomb activated carbon from agriculture waste: symmetrical supercapacitor study

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Metadaten
Titel
MoO3/BiVO4 heterojunction film with oxygen vacancies for efficient and stable photoelectrochemical water oxidation
verfasst von
Yaqi Chen
Minji Yang
Jinyan Du
Gaili Ke
Xiaohui Zhong
Yong Zhou
Faqin Dong
Liang Bian
Huichao He
Publikationsdatum
31.08.2018
Verlag
Springer US
Erschienen in
Journal of Materials Science / Ausgabe 1/2019
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-018-2863-6

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