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Erschienen in: Microsystem Technologies 4/2013

01.04.2013 | Review Paper

Process development of a novel wafer level packaging with TSV applied in high-frequency range transmission

verfasst von: Xiao Chen, Jiajie Tang, Gaowei Xu, Le Luo

Erschienen in: Microsystem Technologies | Ausgabe 4/2013

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Abstract

The process development of a novel wafer level packaging with TSV applied in high-frequency range transmission is presented. A specially designed TSV structure (a core TSV and six shielding TSVs) is adopted to connect the components on different sides of the high-resistivity silicon wafer. And the microstrip line in the microwave monolithic integrated circuit is used to transmit high-frequency signal in packaging structure together with the low permittivity intermediate dielectric polymer, benzocyclobutene. The TSV fabrication process and the multi-layer interconnection is illustrated in details. The electrical measurement result of the microstrip lines connected by TSVs reveals the resistances within 0.719 Ω, a return loss better than 23.8 dB and an insertion loss better than 2.60 dB from 14 to 40 GHz.

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Metadaten
Titel
Process development of a novel wafer level packaging with TSV applied in high-frequency range transmission
verfasst von
Xiao Chen
Jiajie Tang
Gaowei Xu
Le Luo
Publikationsdatum
01.04.2013
Verlag
Springer-Verlag
Erschienen in
Microsystem Technologies / Ausgabe 4/2013
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-012-1712-9

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