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2001 | OriginalPaper | Buchkapitel

Simulation of Advanced n-MOSFET Emphasizing Quantum Mechanical Effects on 2-D Characteristics

verfasst von : Yutao Ma, Lifeng Chen, Bo Jiang, Min Zhang, Lilin Tian, Zhiping Yu, Litian Liut, Zhijian Li

Erschienen in: Simulation of Semiconductor Processes and Devices 2001

Verlag: Springer Vienna

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Advanced n-MOSFET structure with featured size of 90nm channel length is simulated using a newly developed Quantum Mechanical (QM) correction model based on Modified Airy Function (MAF) method. The influences of Quantum Mechanical Effects (QMEs) on the carrier distribution in the whole channel is included and the output as well as the transfer characteristics are compared with and without QM correction. It is demonstrated that QMEs result in more severe short channel effects such as threshold voltage roll off and DIBL effects.

Metadaten
Titel
Simulation of Advanced n-MOSFET Emphasizing Quantum Mechanical Effects on 2-D Characteristics
verfasst von
Yutao Ma
Lifeng Chen
Bo Jiang
Min Zhang
Lilin Tian
Zhiping Yu
Litian Liut
Zhijian Li
Copyright-Jahr
2001
Verlag
Springer Vienna
DOI
https://doi.org/10.1007/978-3-7091-6244-6_89

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