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Erschienen in:
20.07.2016
Structural, optical and dielectric properties of non-crystalline LaTiO3 films prepared by electron-beam evaporation
Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 11/2016
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Abstract
The microstructures, electrical and optical properties of non-crystalline LaTiO3 films deposited by electron-beam evaporation method have been investigated. From the analysis of X-ray photoelectron spectroscopy, it was deduced that relative metal oxidation percent contents of the films is 36.70 % Ti2O3 and 63.30 % La2O3. The As-deposited film possessed a high refractive index and a low extinction coefficient of 1.9805 and 1.576 × 10−5 at the wavelength of 550 nm. An optical band gap of the film obtained from transmission spectra was about 4.65 eV. A crystallization temperature of the film was higher than 750 °C when annealing time was up to 5 min. The annealed LaTiO3 films with non-crystalline structure showed a high dielectric constant of 23.4 at 1 MHz, a low the leakage current density of 5.19 × 10−5 A/cm2 at the gate bias voltage −3 V, and an increasing breakdown voltage of 53.6 V, respectively.