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Erschienen in:
01.12.2019 | NANOSTRUCTURES TECHNOLOGY
XAFS Investigation of Nanoparticle Formation in 64Zn+ Ion Implanted and Thermo Oxidized Quartz
Erschienen in: Semiconductors | Ausgabe 16/2019
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Abstract
The silica glass substrates were implanted by 64Zn+ ions with dose of 5 × 1016 cm−2 and energy of 50 keV. During implantation the ion beam current density was less than 0.5 μA/cm2 to avoid the substrate magnetically heating. After implantation, the substrates were subjected to isochronous for 1h heat treatment in oxygen atmosphere at temperature range from 400 up to 1000oC with a step of 100oC. Zn K-edge EXAFS spectra were measured in fluorescent mode. According to Zn K-edge EXAFS data, Zn in as implanted state and after oxidation at 800oC is fully oxidized and surrounded by O atoms with coordination number of 4. However, in as implanted state there were disordered orientation of Zn atoms, and ordered tetrahedral coordination occurs only after heat treatment at 800oC.