Advanced mask aligner lithography (AMALITH) for thick photoresist

Advanced mask aligner lithography (AMALITH) is a holistic approach to improve shadow printing (contact and proximity lithography) in mask aligners. AMALITH is based on two tools, the MO Exposure Optics^®, a new illumination system allow shaping the angular spectrum of the illumination light, and LAB, a software tool for full 3D simulation of the shadow printing process. MO Exposure Optics^® is provided by SUSS MicroTec AG (http://​www.​suss.​com), as an upgrade for all current and older mask aligner models. MO Exposure Optics^® decouples the illumination from lamp misplacement (self-calibrated light source), improves the light uniformity, provides telecentric illumination and enables customized illumination in mask aligners. LAB is a software tool provided by GenISys GmbH (http://​www.​genisys-gmbh.​com), and allows simulating the complete chain from illumination, mask pattern, photoresist and resist processing. The combination of both tools allows optimizing mask aligner lithography beyond today’s limits.