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Erschienen in: Microsystem Technologies 6/2017

30.03.2016 | Technical Paper

Design and simulation of a novel RF MEMS shunt capacitive switch with low actuation voltage and high isolation

verfasst von: Somayye Molaei, Bahram Azizollah Ganji

Erschienen in: Microsystem Technologies | Ausgabe 6/2017

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Abstract

This paper presents a new RF MEMS capacitive shunt switch with low voltage, low loss and high isolation for K-band applications. In this design, we have proposed the step structure to reduce the air gap between the bridge and the signal line, thus the actuation voltage is reduced to 2.9 V. Furthermore, to reach more isolation, we used aluminum nitride (AlN) as a dielectric layer instead of conventional dielectric materials such as \(Sio_{2}\) and \(Si_{3} N_{4}\) which has more \(\varepsilon_{r}\) led to increase the down-state capacitance and increase the isolation of switch. Moreover, to reach more isolation, a kind of meander have designed to increase the inductance of switch, therefore, the resonant frequency is shifted to the desired frequency band. The results show that the switch in up position involve \(S_{11}\) less than −10 dB from 1 to 40 GHZ and \(S_{21}\) more than −0.72 dB from 1 to 22 GHZ. In down state, switch has an excellent isolation at the frequency range of K-band. The maximum isolation of −58 dB is obtained at resonance frequency of 27 GHZ.

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Literatur
Zurück zum Zitat Bachman M, Yang Z, Minfeng W, Li G (2012) High-power magnetically actuated microswitches fabricated in laminates. Electron Device Lett IEEE 33:1309–1311CrossRef Bachman M, Yang Z, Minfeng W, Li G (2012) High-power magnetically actuated microswitches fabricated in laminates. Electron Device Lett IEEE 33:1309–1311CrossRef
Zurück zum Zitat Cho IJ, Yoon E (2010) Design and fabrication of a single membrane push-pull SPDT RF MEMS switch operated by electromagnetic actuation and electrostatic hold. J Micromech Microeng 20:035028CrossRef Cho IJ, Yoon E (2010) Design and fabrication of a single membrane push-pull SPDT RF MEMS switch operated by electromagnetic actuation and electrostatic hold. J Micromech Microeng 20:035028CrossRef
Zurück zum Zitat Guerre R, Drechsler U, Bhattacharyya D, Rantakari P, Stutz R, Wright RV, Milosavljevic ZD, Vaha-Heikkila T, Kirby PB, Despont M (2010) Wafer-level transfer technologies for PZT-based RF MEMS switches. J Microelectromech Syst 19:548–560CrossRef Guerre R, Drechsler U, Bhattacharyya D, Rantakari P, Stutz R, Wright RV, Milosavljevic ZD, Vaha-Heikkila T, Kirby PB, Despont M (2010) Wafer-level transfer technologies for PZT-based RF MEMS switches. J Microelectromech Syst 19:548–560CrossRef
Zurück zum Zitat He X, Lv Z, Liu B, Li Z (2011) Electrothermally actuated RF MEMS capacitive switch with atomic layer deposited(ALD) dielectrics”. (Solid-state Sensors, Actuators and Microsystems Conference (RANDUCERS), 2011 16th International) IEEE. pp 2470–2473 He X, Lv Z, Liu B, Li Z (2011) Electrothermally actuated RF MEMS capacitive switch with atomic layer deposited(ALD) dielectrics”. (Solid-state Sensors, Actuators and Microsystems Conference (RANDUCERS), 2011 16th International) IEEE. pp 2470–2473
Zurück zum Zitat Lee J, Yang WS, Kang S, Choi CA (2004) Design and parameter-extraction based small-singal modeling of a novel center-anchor MEMS series switch. In proceedings of the 34th European Microwave Conference. Amsterdam, The Netherlands, pp 1433–1436 Lee J, Yang WS, Kang S, Choi CA (2004) Design and parameter-extraction based small-singal modeling of a novel center-anchor MEMS series switch. In proceedings of the 34th European Microwave Conference. Amsterdam, The Netherlands, pp 1433–1436
Zurück zum Zitat Mafinejad Y, Zarghami M, Kouzani AZ (2013) Design and simulation of high isolation RF MEMS shunt capacitor switch for C-K band, Electrical Engineering (ICEE), 21st Iranian cofference, Mashhad, pp 1–5 Mafinejad Y, Zarghami M, Kouzani AZ (2013) Design and simulation of high isolation RF MEMS shunt capacitor switch for C-K band, Electrical Engineering (ICEE), 21st Iranian cofference, Mashhad, pp 1–5
Zurück zum Zitat Majumder S, Lampen J, Morrison R, Maciel J (2003) A packaged high-lifetime ohmic MEMS RF switch. IEEE MTT-S Int Microwave Symp Dig 3:1935–1938 Majumder S, Lampen J, Morrison R, Maciel J (2003) A packaged high-lifetime ohmic MEMS RF switch. IEEE MTT-S Int Microwave Symp Dig 3:1935–1938
Zurück zum Zitat Persano A, Cola A, Angelis G, Taurino A, Siciliano P, Quaranta F (2011) Capacitive RF MEMS switches with Tantalum based materials. J Microelectromech Syst 20(2):365–370CrossRef Persano A, Cola A, Angelis G, Taurino A, Siciliano P, Quaranta F (2011) Capacitive RF MEMS switches with Tantalum based materials. J Microelectromech Syst 20(2):365–370CrossRef
Zurück zum Zitat Rebeiz GM, Muldavin JB (2001) RF MEMS switches and switch circuits. IEEE Microw Mag 2(4):59–71CrossRef Rebeiz GM, Muldavin JB (2001) RF MEMS switches and switch circuits. IEEE Microw Mag 2(4):59–71CrossRef
Zurück zum Zitat Rebeiz GM (2003) RF MEMS: theory, design and technology, Wiley, New Jersey Rebeiz GM (2003) RF MEMS: theory, design and technology, Wiley, New Jersey
Zurück zum Zitat Shekhar S, Vinoy KJ, Ananthasuresh GK (2014) Design, fabrication and characterization of capacitive RF MEMS switches with low pull-in voltage, Microwave and RF Conference (IMaRC), IEEE International, pp 182–185 Shekhar S, Vinoy KJ, Ananthasuresh GK (2014) Design, fabrication and characterization of capacitive RF MEMS switches with low pull-in voltage, Microwave and RF Conference (IMaRC), IEEE International, pp 182–185
Zurück zum Zitat Singh T, Khaira N, Sengar J (2013) A novel capacitive RF MEMS switch design for low voltage application,” Computing, Communications and Networking Technologies (ICCCNT), Fourth International Conference, Tiruchengode, pp 1–6 Singh T, Khaira N, Sengar J (2013) A novel capacitive RF MEMS switch design for low voltage application,” Computing, Communications and Networking Technologies (ICCCNT), Fourth International Conference, Tiruchengode, pp 1–6
Zurück zum Zitat Topalli K, Unlu M, Atasoy HI, Demir S, Civi OA, Akin T (2009) “Empirical formulation of bridge inductance in inductively tuned RF MEMS shunt switches”, progress in Electromagnetic Research. PIER 97:343–356CrossRef Topalli K, Unlu M, Atasoy HI, Demir S, Civi OA, Akin T (2009) “Empirical formulation of bridge inductance in inductively tuned RF MEMS shunt switches”, progress in Electromagnetic Research. PIER 97:343–356CrossRef
Metadaten
Titel
Design and simulation of a novel RF MEMS shunt capacitive switch with low actuation voltage and high isolation
verfasst von
Somayye Molaei
Bahram Azizollah Ganji
Publikationsdatum
30.03.2016
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 6/2017
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-016-2923-2

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