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Erschienen in: Microsystem Technologies 3/2013

01.03.2013 | Technical Paper

Fabrication of two dimensional high aspect ratio polymer photonic crystal laser

verfasst von: Jie Zhou, Gang Liu, Xiaobo Zhang, Xueliang Kang, Ying Xiong, Yangchao Tian

Erschienen in: Microsystem Technologies | Ausgabe 3/2013

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Abstract

Photonic crystals have attracted much attention from researchers because of the control over the propagation and emission of light and particular optical properties. In this paper, we reported on the design, fabrication and test of a two-dimensional polymer photonic crystal laser. First of all, a two-dimensional polymer photonic crystal laser with a triangle-lattice structure was described. Rhodamine 6G doped in PMMA was chosen as the gain material. Then, plane wave method based on the Maxwell equations was utilized to calculate the distribution of the photonic band gap. We calculated the band structure of a triangle lattice photonic crystal with a low refractive index. High resolution electron beam lithography combined with electroplating was used to fabricate the silicon nitride mask. A high aspect ratio two-dimensional photonic crystal laser was fabricated by X-ray lithography in one-step process to overcome the limitation of the thickness by the conventional methods to realize a real two-dimensional laser. Meanwhile, processes of sample preparations and fabrication were optimized in order to avoid the oxidation of the gain material and reduce the diffraction effect on the structures.

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Metadaten
Titel
Fabrication of two dimensional high aspect ratio polymer photonic crystal laser
verfasst von
Jie Zhou
Gang Liu
Xiaobo Zhang
Xueliang Kang
Ying Xiong
Yangchao Tian
Publikationsdatum
01.03.2013
Verlag
Springer-Verlag
Erschienen in
Microsystem Technologies / Ausgabe 3/2013
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-012-1730-7

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