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Erschienen in: Microsystem Technologies 5/2018

15.12.2017 | Technical Paper

Wafer-level vacuum package of two-dimensional micro-scanner

verfasst von: Hoang Manh Chu, Takashi Sasaki, Kazuhiro Hane

Erschienen in: Microsystem Technologies | Ausgabe 5/2018

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Abstract

We present wafer-level vacuum package of two-dimensional (2-D) micro-scanner based on glass-silicon anodic bonding. To form the sacrificial gap for evacuating air in the package cavity before hermetically sealed, the reflow process of Au/Sn/Cr posts due to low-melting temperature of Sn metal is introduced. Structures in Pyrex glass wafers are patterned using wet etching in the 49% HF solution. The 2-D micro-scanner is fabricated by the SOI-based micromachining technology. The resonant frequencies of 2-D micro-scanner after packaged in vacuum are 30 kHz and 290 Hz for the inner mirror and the gimbal frame respectively. The rotation angle of packaged 2-D micro-scanner is 25° at driving voltages of 20 and 17 V for the inner mirror and the gimbal frame respectively. The pressure in the package is estimated in terms of measuring the quality factor of packaged 2-D micro-scanner. The effect of packaging on the performance of the 2-D micro-scanner such as squeeze film air damping caused by the optical window and the substrate is also analyzed in this paper.

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Metadaten
Titel
Wafer-level vacuum package of two-dimensional micro-scanner
verfasst von
Hoang Manh Chu
Takashi Sasaki
Kazuhiro Hane
Publikationsdatum
15.12.2017
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 5/2018
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-017-3668-2

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