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Erschienen in: Microsystem Technologies 12/2014

01.12.2014 | Technical Paper

Fabrication of AFM probe with CuO nanowire formed by stress-induced method

verfasst von: Atsushi Hosoi, Hisataka Koto, Yang Ju

Erschienen in: Microsystem Technologies | Ausgabe 12/2014

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Abstract

A novel method has been proposed to fabricate an atomic force microscope (AFM) probe using CuO nanowire and a stress-induced method that can form the nanowire easily. By heating a commercial AFM probe with a film coating of Ta and Cu, a Cu hillock with CuO nanowires on its surface could be formed at the end of the probe. The thickness of the coating films, the heating temperature, and the heating time were investigated to obtain CuO nanowires with a high aspect ratio for use as an AFM probe tip. It was found that a suitable probe tip can be fabricated using the a Cu film thickness of 700 nm, a heating temperature of 380 °C and a heating time of 6 h. Probe tips (~5 μm high) and nanowires of ~25 nm diameter were obtained successfully. In the range evaluated, the measurement resolution of the CuO nanowire probe was slightly worse than that of a commercial AFM probe. However, both probes had almost the same dimensional measurement precision.

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Metadaten
Titel
Fabrication of AFM probe with CuO nanowire formed by stress-induced method
verfasst von
Atsushi Hosoi
Hisataka Koto
Yang Ju
Publikationsdatum
01.12.2014
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 12/2014
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-014-2317-2

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